| Customization: | Available |
|---|---|
| Application: | Ceramic Decorations |
| Grain Size: | <100nm |
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| Description | ceramic ring |
| Material | 99.8% Alumina ceramic or SiC |
| Features | No trace metal contamination, No particle, High resistance |
| Applications | 200mm,300mm semi equipment |
| Usage on semiconductor |
During the chip manufacturing process, semiconductor ceramic rings are used in wafer processing equipment. For example, in chemical vapor deposition (CVD) and physical vapor deposition (PVD) equipment, they serve as components for carrying wafers. Thanks to their good chemical stability, they can withstand the erosion of various chemical gases. For instance, during the CVD process, reactive gases such as silane (SiH4) will be introduced into the equipment to grow thin films, and the ceramic rings will not react chemically with these gases, thus ensuring the purity of the wafer growth environment.
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